Ion-doped transition metal dichalcogenide transistors
published: May 24, 2015, recorded: May 2015, views: 1758
Report a problem or upload filesIf you have found a problem with this lecture or would like to send us extra material, articles, exercises, etc., please use our ticket system to describe your request and upload the data.
Enter your e-mail into the 'Cc' field, and we will keep you updated with your request's status.
Atomically-thin transistors are the subject of growing interest for microelectronic applications. These materials offer superior electrostatic gate control, low interface state density, strain-relaxed heterojunction formation, and flexibility. For devices these systems need techniques for large area growth, defect control, ohmic contacts, junction doping, gate dielectric nucleation, low oxide thickness gate stacks, and self-alignment processes. This talk will summarize recent progress in development of transition metal dichalcogenide transistors in nanotube and flake geometries. An approach for doping these devices using solid polymer dielectrics and ions like lithium and cesium will be shown.
Download slides: kolokviji_seabaugh_dichalcogenide_transistors_01.pdf (27.0 MB)
Link this pageWould you like to put a link to this lecture on your homepage?
Go ahead! Copy the HTML snippet !
Write your own review or comment: